Small-size ECR Ion Shower System For etching and other various purposes.


반도체 장치

실험실 설비/재료 


●Stable and high-density reactive ion beams, including oxygen, are available for a long-interval. 

●As the EIS-200ER provides a high electron current density even at low acceleration voltages, procedures such as etching without giving serious damage to the substrate, and cleaning of the specimen surface, are possible. 

●Equipped with a neutralization electrode, it allows for etching of insulators. 

●Thin film deposition of metals with high melting points is possible. 

●The ion gun of the EIS-200ER, which can be attached to various vacuum systems, is separately available.


한솔과학 주식회사 / 대표이사: 곽관순 / 사업자 번호 213-83-35579

Tel: 02-473-3567 /  Fax: 02-473-6777