Outline

●Stable and high-density reactive ion beams, including oxygen, are available for a long-interval. 

●As the EIS-200ER provides a high electron current density even at low acceleration voltages, procedures such as etching without giving serious damage to the substrate, and cleaning of the specimen surface, are possible. 

●Equipped with a neutralization electrode, it allows for etching of insulators. 

●Thin film deposition of metals with high melting points is possible. 

●The ion gun of the EIS-200ER, which can be attached to various vacuum systems, is separately available.